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Atomic Layer Deposition (ALD)

The atomic layer deposition (ALD) systems (Savannah®, Fiji® and Phoenix® Firebird™) are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. A wide variety of thin films can be deposited using gas, liquid, or solid precursors.

 

ALD precursors packed in suitable bubblers for various ALD tools are available. Let us know your requirements.

Savannah ALD System
Savannah ALD System

Savannah - Thermal ALD for R&D

Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah® is available in three configurations: S100, S200, and S300. Savannah® is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah® thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah® is capable of handling gas, liquid, or solid precursors.

 

Key features include:

  • In-Situ Ellipsometry
  • In-Situ QCM
  • Self Assembling Monolayers
  • 2-Second Cycle Times
  • Integrated Ozone
  • Low Vapor Pressure Deposition
  • Batch Processing
  • Glove Box Integration

Fiji - Plasma Enhanced ALD for R&D

Fiji® series is a modular, high-vacuum thermal ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The Fiji G2 is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition. 

 

It is available with up to six precursor lines that can accommodate solid, liquid or gas precursors, and six plasma gas lines, offering significant experimental flexibility in a compact and affordable footprint.

 

Fiji’s advanced features include:

  • Proprietary Chamber Turbo Pumping System
  • Improved Plasma Design
  • Ergonomic Operator Interface
  • In-Situ Ellipsometry
  • In-Situ Quartz Crystal Microbalance
  • Integrated Ozone
  • Glove Box Interface

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